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Silver Sintering Film
QLAgF7110 is a nano-silver film for pressure-assisted sintering processes, which utilizes a film transfer technique for simple and highly efficient operation. The sintering joints exhibit excellent electrical and thermal conductivity as well as superior interfacial connection strength, making it suitable for die attachment sintering and large-area wafer bonding.
QLAgF7110 Silver Sintering FilmAdvantages

Excellent transfer performance, no pre-cutting required, suitable for embedded package.

Uniform film thickness, suitable for large-area wafer bonding.

High shear strength, with shear strength exceeding 60 MPa.

High thermal conductivity, thermal conductivity > 200 W/mK.

Basic Parameters
Indicators
Performance
Remarks
Solid  content
≥99%
According to TG results
Particle  size
≤3 μm

Halogen  content
Zero  halogen

Operation  technology
Transfer  printing

Sintering  temperature
230-250 ℃

Sintering  pressure
10-20 MPa

Sintering  atmosphere
Vacuum, inert  atmosphere

Sintered  surface
Ag, Au, Cu

Whether  residue  needs  to  be  cleaned
No  cleaning
There is no residue on the substrate surface
Storage  condition
Room  temperature, nitrogen atmosphere

Shelf  life
6 months